Use of corrosion inhibiting compounds in post-etch cleaning processes of an integrated circuit
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United States of America Patent
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Sep 12, 2000
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N/A
app pub date -
Feb 12, 1998
filing date -
Feb 12, 1998
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Abstract
A corrosion inhibiting cleaning process for removing etch-residue from an integrated circuit substrate is described. The corrosion inhibiting cleaning process includes: (1) obtaining an integrated circuit substrate that has undergone etching; and (2) cleaning the integrated circuit substrate using a post-etch cleaning solution including a corrosion inhibiting agent in a sufficient concentration to effectively inhibit corrosion of the integrated circuit substrate.
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