Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 12, 2000
Issued Date -
N/A
app pub date -
Mar 24, 1997
filing date -
Mar 2, 1994
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.
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