Removable liner design for plasma immersion ion implantation
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United States of America Patent
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Sep 19, 2000
Grant Date -
N/A
app pub date -
Dec 18, 1998
filing date -
Feb 11, 1998
priority date (Note) -
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Abstract
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. The system (200) also includes a silicon liner, which is used to line inner portions of the chamber walls.
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