Method of micromachining a scanning torsion mirror
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United States of America Patent
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Sep 19, 2000
Grant Date -
N/A
app pub date -
Nov 10, 1999
filing date -
Oct 22, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of forming a silicon nitride scanning torsion mirror which includes depositing a silicon nitride layer on a support substrate, etching the silicon nitride layer to form a mirror supported within the layer by integral torsion hinges and then selectively etching the substrate under the mirror to form a well.
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