Reaction resin mixtures and use thereof
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United States of America Patent
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Oct 3, 2000
Grant Date -
N/A
app pub date -
Jun 26, 1998
filing date -
Jun 30, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Curable reaction resin mixtures which are suitable for stereolithography have the following composition: a cationically curable monomer and/or oligomer, an initiator with the following structure: ##STR1## where the following applies: R.sup.1 and R.sup.2 are alkyl or cycloalkyl, or together with the S atom they form a heterocyclic ring, R.sup.3 is H or alkyl, R.sup.4, R.sup.5, R.sup.6 and R.sup.7 are H, alkyl or alkoxy, X.sup.- is a non-nucleophilic anion, and optionally a filler, pigment and/or additive.
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