Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device

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United States of America Patent

PATENT NO 6127199
SERIAL NO

09113373

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Abstract

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A method of manufacturing an active matrix substrate is provided that uses a technique of transferring a thin film device. In forming thin film transistors and pixel electrodes on an original substrate before transfer, an insulator film such as an interlayer insulation film or the like, is previously removed before the pixel electrodes are formed. Further, the original substrate is separated by exfoliation to transfer the device to a transfer material to cause the pixel electrodes to partially appear in the surface or the vicinity of the surface of the device. This portion permits application of a voltage to a liquid crystal through the pixel electrode.

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Patent Owner(s)

  • SEIKO EPSON CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inoue, Satoshi Chino, JP 505 10099
Shimoda, Tatsuya Nagano-ken, JP 213 9883

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