Method of exposing thermoresist
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United States of America Patent
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Oct 24, 2000
Grant Date -
N/A
app pub date -
Jun 5, 1998
filing date -
Jun 5, 1998
priority date (Note) -
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Abstract
Low contrast optics, including low contrast linear light valves, can be used to create high resolution patterns by using thermoresist instead of photoresist and by using multiple exposures of the same area, preferably exposing different features of the pattern in each exposure. When using thermoresist, the stray light from imaging the individual features does not add up, as the stray heat it creates will dissipate between exposures. The method is particularly useful for imaging thermoresists using UV light for manufacturing of integrated circuits.
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