| 6,620,723 Formation of boride barrier layers using chemisorption techniques
|
113 |
2000
|
| 6,551,929 Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
|
191 |
2000
|
| 6,855,368 Method and system for controlling the presence of fluorine in refractory metal layers
|
30 |
2000
|
| 7,101,795 Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer
|
24 |
2000
|
| 6,951,804 Formation of a tantalum-nitride layer
|
52 |
2001
|
| 6,660,126 Lid assembly for a processing system to facilitate sequential deposition techniques
|
92 |
2001
|
| 6,734,020 Valve control system for atomic layer deposition chamber
|
71 |
2001
|
| 6,849,545 System and method to form a composite film stack utilizing sequential deposition techniques
|
24 |
2001
|
| 7,085,616 Atomic layer deposition apparatus
|
16 |
2001
|
| 6,718,126 Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
|
96 |
2001
|
| 6,936,906 Integration of barrier layer and seed layer
|
32 |
2001
|
| 6,638,810 Tantalum nitride CVD deposition by tantalum oxide densification
|
48 |
2001
|
| 6,878,206 Lid assembly for a processing system to facilitate sequential deposition techniques
|
28 |
2001
|
| 6,729,824 Dual robot processing system
|
18 |
2001
|
| 6,765,178 Chamber for uniform substrate heating
|
14 |
2001
|
| 6,916,398 Gas delivery apparatus and method for atomic layer deposition
|
87 |
2001
|
| 6,811,814 Method for growing thin films by catalytic enhancement
|
12 |
2002
|
| 6,827,978 Deposition of tungsten films
|
33 |
2002
|
| 6,833,161 Cyclical deposition of tungsten nitride for metal oxide gate electrode
|
43 |
2002
|
| 7,439,191 Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
|
0 |
2002
|
| 6,911,391 Integration of titanium and titanium nitride layers
|
29 |
2002
|
| 6,846,516 Multiple precursor cyclical deposition system
|
70 |
2002
|
| 6,720,027 Cyclical deposition of a variable content titanium silicon nitride layer
|
49 |
2002
|
| 6,875,271 Simultaneous cyclical deposition in different processing regions
|
46 |
2002
|
| 6,869,838 Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications
|
8 |
2002
|
| 6,932,871 Multi-station deposition apparatus and method
|
39 |
2002
|
| 6,838,125 Method of film deposition using activated precursor gases
|
72 |
2002
|
| 7,211,144 Pulsed nucleation deposition of tungsten layers
|
38 |
2002
|
| 6,936,538 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics
|
53 |
2002
|
| 6,998,014 Apparatus and method for plasma assisted deposition
|
58 |
2002
|
| 6,955,211 Method and apparatus for gas temperature control in a semiconductor processing system
|
44 |
2002
|
| 7,081,271 Cyclical deposition of refractory metal silicon nitride
|
30 |
2002
|
| 7,066,194 Valve design and configuration for fast delivery system
|
34 |
2002
|
| 6,772,072 Method and apparatus for monitoring solid precursor delivery
|
76 |
2002
|
| 6,915,592 Method and apparatus for generating gas to a processing chamber
|
53 |
2002
|
| 6,773,507 Apparatus and method for fast-cycle atomic layer deposition
|
77 |
2002
|
| 6,797,340 Method for depositing refractory metal layers employing sequential deposition techniques
|
46 |
2002
|
| 6,905,737 Method of delivering activated species for rapid cyclical deposition
|
28 |
2002
|
| 7,780,785 Gas delivery apparatus for atomic layer deposition
|
3 |
2002
|
| 6,939,804 Formation of composite tungsten films
|
39 |
2002
|
| 6,866,746 Clamshell and small volume chamber with fixed substrate support
|
59 |
2002
|
| 6,825,447 Apparatus and method for uniform substrate heating and contaminate collection
|
4 |
2002
|
| 6,809,026 Selective deposition of a barrier layer on a metal film
|
27 |
2002
|
| 7,175,713 Apparatus for cyclical deposition of thin films
|
35 |
2003
|
| 6,994,319 Membrane gas valve for pulsing a gas
|
15 |
2003
|
| 6,868,859 Rotary gas valve for pulsing a gas
|
50 |
2003
|
| 6,821,563 Gas distribution system for cyclical layer deposition
|
112 |
2003
|
| 6,972,267 Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
|
31 |
2003
|
| 6,831,004 Formation of boride barrier layers using chemisorption techniques
|
48 |
2003
|
| 7,279,432 System and method for forming an integrated barrier layer
|
11 |
2003
|
| 7,041,335 Titanium tantalum nitride silicide layer
|
33 |
2003
|
| 6,958,296 CVD TiSiN barrier for copper integration
|
24 |
2003
|
| 7,204,886 Apparatus and method for hybrid chemical processing
|
35 |
2003
|
| 7,201,803 Valve control system for atomic layer deposition chamber
|
13 |
2003
|
| 6,998,579 Chamber for uniform substrate heating
|
2 |
2003
|
| 7,262,133 Enhancement of copper line reliability using thin ALD tan film to cap the copper line
|
2 |
2003
|
| 7,244,683 Integration of ALD/CVD barriers with porous low k materials
|
4 |
2003
|
| 8,323,754 Stabilization of high-k dielectric materials
|
0 |
2004
|
| 8,119,210 Formation of a silicon oxynitride layer on a high-k dielectric material
|
1 |
2004
|
| 7,049,226 Integration of ALD tantalum nitride for copper metallization
|
40 |
2004
|
| 7,211,508 Atomic layer deposition of tantalum based barrier materials
|
46 |
2004
|
| 7,022,948 Chamber for uniform substrate heating
|
3 |
2004
|
| 7,033,922 Method and system for controlling the presence of fluorine in refractory metal layers
|
24 |
2004
|
| 7,905,959 Lid assembly for a processing system to facilitate sequential deposition techniques
|
1 |
2004
|
| 7,208,413 Formation of boride barrier layers using chemisorption techniques
|
43 |
2004
|
| 7,115,499 Cyclical deposition of tungsten nitride for metal oxide gate electrode
|
22 |
2004
|
| 7,429,402 Ruthenium as an underlayer for tungsten film deposition
|
18 |
2004
|
| 7,405,158 Methods for depositing tungsten layers employing atomic layer deposition techniques
|
9 |
2005
|
| 7,352,048 Integration of barrier layer and seed layer
|
3 |
2005
|
| 7,780,788 Gas delivery apparatus for atomic layer deposition
|
2 |
2005
|
| 7,094,680 Formation of a tantalum-nitride layer
|
44 |
2005
|
| 7,270,709 Method and apparatus of generating PDMAT precursor
|
25 |
2005
|
| 8,343,279 Apparatuses for atomic layer deposition
|
1 |
2005
|
| 7,238,552 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics
|
13 |
2005
|
| 7,779,784 Apparatus and method for plasma assisted deposition
|
1 |
2005
|
| 7,294,208 Apparatus for providing gas to a processing chamber
|
13 |
2005
|
| 7,094,685 Integration of titanium and titanium nitride layers
|
20 |
2005
|
| 7,547,465 Multi-station deposition apparatus and method
|
0 |
2005
|
| 7,384,867 Formation of composite tungsten films
|
10 |
2005
|
| 7,402,534 Pretreatment processes within a batch ALD reactor
|
6 |
2005
|
| 7,514,358 Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
|
1 |
2005
|
| 7,781,326 Formation of a tantalum-nitride layer
|
0 |
2005
|
| 7,464,917 Ampoule splash guard apparatus
|
6 |
2005
|
| 7,470,611 In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
|
3 |
2005
|
| 7,115,494 Method and system for controlling the presence of fluorine in refractory metal layers
|
23 |
2006
|
| 7,798,096 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
|
2 |
2006
|
| 7,228,873 Valve design and configuration for fast delivery system
|
29 |
2006
|
| 7,588,736 Apparatus and method for generating a chemical precursor
|
2 |
2006
|
| 7,547,952 Method for hafnium nitride deposition
|
5 |
2006
|
| 7,892,602 Cyclical deposition of refractory metal silicon nitride
|
1 |
2006
|
| 7,660,644 Atomic layer deposition apparatus
|
1 |
2006
|
| 7,871,470 Substrate support lift mechanism
|
1 |
2006
|
| 7,416,979 Deposition methods for barrier and tungsten materials
|
18 |
2006
|
| 7,235,486 Method for forming tungsten materials during vapor deposition processes
|
8 |
2006
|
| 8,318,266 Enhanced copper growth with ultrathin barrier layer for high performance interconnects
|
0 |
2006
|
| 8,293,328 Enhanced copper growth with ultrathin barrier layer for high performance interconnects
|
0 |
2006
|
| 7,682,984 Interferometer endpoint monitoring device
|
0 |
2006
|
| 7,429,516 Tungsten nitride atomic layer deposition processes
|
9 |
2006
|
| 7,422,637 Processing chamber configured for uniform gas flow
|
2 |
2006
|
| 7,775,508 Ampoule for liquid draw and vapor draw with a continuous level sensor
|
0 |
2006
|
| 7,850,779 Apparatus and process for plasma-enhanced atomic layer deposition
|
5 |
2006
|
| 7,682,946 Apparatus and process for plasma-enhanced atomic layer deposition
|
2 |
2006
|
| 7,678,194 Method for providing gas to a processing chamber
|
0 |
2006
|
| 7,429,361 Method and apparatus for providing precursor gas to a processing chamber
|
11 |
2006
|
| 7,695,563 Pulsed deposition process for tungsten nucleation
|
1 |
2007
|
| 7,402,210 Apparatus and method for hybrid chemical processing
|
20 |
2007
|
| 7,595,263 Atomic layer deposition of barrier materials
|
2 |
2007
|
| 8,110,489 Process for forming cobalt-containing materials
|
0 |
2007
|
| 7,501,344 Formation of boride barrier layers using chemisorption techniques
|
1 |
2007
|
| 7,501,343 Formation of boride barrier layers using chemisorption techniques
|
1 |
2007
|
| 7,494,908 Apparatus for integration of barrier layer and seed layer
|
2 |
2007
|
| 7,465,665 Method for depositing tungsten-containing layers by vapor deposition techniques
|
11 |
2007
|
| 7,465,666 Method for forming tungsten materials during vapor deposition processes
|
11 |
2007
|
| 7,749,815 Methods for depositing tungsten after surface treatment
|
0 |
2007
|
| 7,867,914 System and method for forming an integrated barrier layer
|
0 |
2007
|
| 7,597,758 Chemical precursor ampoule for vapor deposition processes
|
2 |
2007
|
| 7,521,379 Deposition and densification process for titanium nitride barrier layers
|
3 |
2007
|
| 8,282,992 Methods for atomic layer deposition of hafnium-containing high-K dielectric materials
|
1 |
2007
|
| 7,794,544 Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
|
6 |
2007
|
| 8,158,526 Endpoint detection for photomask etching
|
0 |
2007
|
| 8,092,695 Endpoint detection for photomask etching
|
0 |
2007
|
| 7,964,505 Atomic layer deposition of tungsten materials
|
1 |
2008
|
| 7,605,083 Formation of composite tungsten films
|
1 |
2008
|
| 7,972,978 Pretreatment processes within a batch ALD reactor
|
0 |
2008
|
| 7,611,990 Deposition methods for barrier and tungsten materials
|
1 |
2008
|
| 7,591,907 Apparatus for hybrid chemical processing
|
7 |
2008
|
| 7,745,333 Methods for depositing tungsten layers employing atomic layer deposition techniques
|
0 |
2008
|
| 7,745,329 Tungsten nitride atomic layer deposition processes
|
0 |
2008
|
| 7,569,191 Method and apparatus for providing precursor gas to a processing chamber
|
4 |
2008
|
| 7,732,327 Vapor deposition of tungsten materials
|
0 |
2008
|
| 8,123,860 Apparatus for cyclical depositing of thin films
|
0 |
2008
|
| 8,146,896 Chemical precursor ampoule for vapor deposition processes
|
0 |
2008
|
| 7,699,295 Ampoule splash guard apparatus
|
0 |
2008
|
| 7,709,385 Method for depositing tungsten-containing layers by vapor deposition techniques
|
1 |
2008
|
| 7,674,715 Method for forming tungsten materials during vapor deposition processes
|
1 |
2008
|
| 7,670,945 In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
|
2 |
2008
|
| 7,732,325 Plasma-enhanced cyclic layer deposition process for barrier layers
|
2 |
2009
|
| 7,867,896 Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
|
0 |
2009
|
| 7,838,441 Deposition and densification process for titanium nitride barrier layers
|
1 |
2009
|
| 7,794,789 Multi-station deposition apparatus and method
|
0 |
2009
|
| 7,846,840 Method for forming tungsten materials during vapor deposition processes
|
0 |
2009
|
| 7,860,597 Atomic layer deposition apparatus
|
1 |
2009
|
| 8,114,789 Formation of a tantalum-nitride layer
|
0 |
2010
|
| 7,923,069 Multi-station deposition apparatus and method
|
0 |
2010
|
| 8,027,746 Atomic layer deposition apparatus
|
0 |
2010
|
| 8,187,970 Process for forming cobalt and cobalt silicide materials in tungsten contact applications
|
0 |
2010
|
| 6,559,472 Film composition
|
39 |
2002
|
| 6,596,636 ALD method to improve surface coverage
|
47 |
2002
|
| 6,861,094 Methods for forming thin layers of materials on micro-device workpieces
|
24 |
2002
|
| 6,838,114 Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
|
37 |
2002
|
| 7,118,783 Methods and apparatus for vapor processing of micro-device workpieces
|
2 |
2002
|
| 6,821,347 Apparatus and method for depositing materials onto microelectronic workpieces
|
40 |
2002
|
| 6,955,725 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
|
7 |
2002
|
| 6,835,980 Semiconductor device with novel film composition
|
0 |
2003
|
| 7,335,396 Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
|
10 |
2003
|
| 7,344,755 Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
|
1 |
2003
|
| 7,235,138 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
|
0 |
2003
|
| 7,422,635 Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
|
3 |
2003
|
| 7,056,806 Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
|
13 |
2003
|
| 7,282,239 Systems and methods for depositing material onto microfeature workpieces in reaction chambers
|
3 |
2003
|
| 7,323,231 Apparatus and methods for plasma vapor deposition processes
|
4 |
2003
|
| 7,581,511 Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
|
3 |
2003
|
| 7,647,886 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
|
0 |
2003
|
| 7,527,693 Apparatus for improved delivery of metastable species
|
1 |
2003
|
| 7,258,892 Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
|
4 |
2003
|
| 7,906,393 Methods for forming small-scale capacitor structures
|
0 |
2004
|
| 7,584,942 Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
|
0 |
2004
|
| 8,133,554 Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
|
0 |
2004
|
| 7,393,562 Deposition methods for improved delivery of metastable species
|
3 |
2004
|
| 7,699,932 Reactors, systems and methods for depositing thin films onto microfeature workpieces
|
0 |
2004
|
| 6,949,827 Semiconductor device with novel film composition
|
0 |
2004
|
| 7,588,804 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
|
0 |
2004
|
| 7,387,685 Apparatus and method for depositing materials onto microelectronic workpieces
|
3 |
2004
|
| 7,481,887 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
|
1 |
2004
|
| 7,399,499 Methods of gas delivery for deposition processes and methods of depositing material on a substrate
|
1 |
2005
|
| 7,279,398 Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
|
1 |
2006
|
| 7,771,537 Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition
|
1 |
2006
|
| 8,384,192 Methods for forming small-scale capacitor structures
|
0 |
2011
|
