Semiconductor workpiece cleaning method and apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Nov 14, 2000
Grant Date -
N/A
app pub date -
May 15, 1997
filing date -
Nov 11, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A semiconductor workpiece cleaning apparatus includes a cleaning arrangement that cleans a semiconductor workpiece by use of a cleaning liquid, a charging arrangement that brings into a chamber a drying liquid, and a discharging arrangement that discharges the cleaning liquid. The cleaning arrangement cleans the workpiece by spraying chemical liquid and/or pure water in the chamber, and by immersing the workpiece in the chemical liquid and/or pure water. The charging arrangement takes in the drying chemical liquid or vapor so as to contact the processing chemical liquid or pure water in which the semiconductor workpiece is immersed. The discharging arrangement discharges the processing chemical liquid or pure water while preserving an interface between the processing chemical liquid or pure water and the drying chemical liquid or vapor.
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