Apparatus for processing substrates in a fluid tank
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United States of America Patent
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-
Nov 14, 2000
Grant Date -
N/A
app pub date -
Oct 23, 1998
filing date -
Apr 24, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for the processing of substrates in a fluid tank is provided. The fluid tank has at least one fluid inlet opening and at least one overflow opening in the upper region of at least one side wall of the fluid tank. Optimum adaptation to fluid circulation rates is provided by at least one slide having a variable position relative to the overflow opening for varying the opening area thereof. This opening area is smaller during introduction of gas than during a preceding rinsing process.
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