Cleaning gas
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United States of America Patent
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Nov 14, 2000
Grant Date -
N/A
app pub date -
Jan 7, 2000
filing date -
Jan 12, 1999
priority date (Note) -
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Abstract
A cleaning gas which is employed to remove an unnecessary deposited material formed in a thin film forming apparatus by thermal decomposition of pentaethoxytantalum or tetraethoxysilane without damaging a reactor, tools, parts and piping of a silicon oxide film-forming apparatus or a tantalum oxide film-forming apparatus. The cleaning gas comprises HF gas and at least one of an oxygen-containing gas, a fluorine gas, a chlorine fluoride gas, a bromine fluoride gas and an iodine fluoride gas.
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