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Abstract

A method and apparatus for treating the epidermis with actinic light includes a solid state diode system with a continuous output. The light beam is generated by either a high power light emitting diode or a laser diode or a combination thereof. A computer controlled pattern generator (CCPG) directs the continuous light beam to trace predetermined patterns on a selected area of the skin. This integrated continuous light source and patterned treatment technique obviate the need for high peak power pulsed systems, while providing sufficient energy density at the target site to effect hair removal and other skin treatment modalities. The moving light beam has a computer controlled dwell time to generate a relatively high amount of energy in a short period of time at the target. The optimum dwell time is about 0.5 ms to 500 ms, and the wavelength is in the range of 600 nm to 990 nm. The spot size is in the range of 0.01 to 10.0 mm and the treatment area is in the range of 0.01 to 100 cm.sup.2. The CCPG patterns enable the moving focal spot of light to irradiate all of the treatment area uniformly with minimum overlap. The patterns may comprise regular geometric forms, or may comprise non-uniform random patterns. In either case, focal spot movement is controlled to avoid excessive irradiation of any point within the treatment area, and avoid localized temperature buildup that can occur when the spot is retraced too often through the same locality.

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