Method and apparatus for improving the performance of an aperture monitoring system
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United States of America Patent
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Dec 5, 2000
Grant Date -
N/A
app pub date -
Jun 3, 1999
filing date -
Jun 3, 1999
priority date (Note) -
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Abstract
A monitoring system for use in detecting the presence of an obstacle in or proximate to an aperture. Materials are applied to one or more reflecting surfaces adjacent the aperture, enabling the improvement of the signal-to-noise ratio in the system without requiring tuning the system for the particular environment. The choice of specific material depends upon the type of radiation used for aperture monitoring and whether an obstacle is detected as an increase or decrease in reflected radiation. A calibration LED within the monitoring system enables predictable performance over a range of temperatures. The monitoring system is also provided with the capacity to adjust to variations in the background-reflected radiation, either automatically by monitoring trends in system performance or by external command. The latter case includes the use of a further element for communicating to the monitoring system directly or indirectly.
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