Plasma processing method and apparatus
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United States of America Patent
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Dec 12, 2000
Issued Date -
N/A
app pub date -
Apr 2, 1999
filing date -
Feb 20, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a plasma processing method and apparatus, microwaves are radiated from a slot antenna set at the bottom of a resonator, a plasma is generated using the microwave and a sample is processed by the plasma. A plasma having a ring-form is generated by the microwaves radiated from the slot antennas, which are disposed at an angle which is neither in parallel to nor perpendicular to a surface current flowing on a slot antenna plate. Thereby, the sample is uniformly processed.
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