Method and apparatus for variably controlling the temperature in a selective deposition modeling environment
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United States of America Patent
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Dec 19, 2000
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N/A
app pub date -
Feb 25, 1999
filing date -
Feb 25, 1999
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Abstract
A method, system and apparatus for variably controlling the temperature in a selective deposition modeling environment. The temperature of the formed portion of the three-dimensional object is detected. A gas is forced onto a surface of the formed portion of the three-dimensional object. The forced gas has a characteristic, such as temperature and quantity, that is variably controlled based on the detected temperature of the formed portion of the three-dimensional object.
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