Method for closed loop control of chemical vapor deposition process
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United States of America Patent
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Dec 19, 2000
Grant Date -
N/A
app pub date -
May 14, 1997
filing date -
May 14, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention is directed to a method of controlling the application of a surface coating by chemical deposition using a closed loop control on growth rate. The method compares a measure of growth rate against a setpoint for the growth rate and adjusts a primary input parameter in order to drive/maintain the measure of growth rate equal to the setpoint.
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