Buffer grated structure for metrology mark and method for making the same
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United States of America Patent
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Jan 9, 2001
Grant Date -
N/A
app pub date -
Jun 27, 1997
filing date -
Jun 27, 1997
priority date (Note) -
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Abstract
A semiconductor wafer is disclosed including a set of alignment marks and buffer structure. The buffer structure may collect or trap fabrication and/or processing materials and/or contaminants that may arise in the further fabrication steps and that may adversely affect the alignment marks. The buffer structure thus helps to preserve the alignment marks such that, e.g., lithographic masks used in fabricating the semiconductor wafer may be accurately aligned during further processing.
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