Multideck wafer processing system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 23, 2001
Grant Date -
N/A
app pub date -
Apr 30, 1996
filing date -
Apr 30, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A multideck wafer processing system is described for the treatment of semiconductor wafers. The system includes at least two process chambers stacked one above the other to provide for higher wafer throughput per unit area of cleanroom space. The stacked process chambers enable sharing of pressurization, gas, electrical, and control support services for the processing chambers.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully