Sputtering target of dielectrics having high strength and a method for manufacturing same

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United States of America Patent

PATENT NO 6176986
SERIAL NO

08863194

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Abstract

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A dielectric sputtering target of high strength comprising a sintered barium, strontium titanate body, which is oxygen deficient, of the formula: Ba.sub.1-x Sr.sub.x TiO.sub.3-y, wherein 0

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION3-2 OTEMACHI 1-CHOME CHIYODA-KU TOKYO 100-8117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mishima, Akifumi Omiya, JP 18 253
Watanabe, Kazuo Omiya, JP 253 2964

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