Importance

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Abstract

An apparatus for metal line deposition and a method for metal line deposition using the apparatus. A donor plate has a donor substrate transparent to a focused coherent light beam. The donor plate has a donor surface coated with a metallic material. The donor plate is positioned so the coated donor surface is adjacent a deposition substrate. A focused coherent light beam is diffracted to form a plurality of coherent light beams. The plurality of beams are directed through the donor substrate and arranged along a line on the metallic material coating the donor surface. The plurality of beams cause the metallic material to ablate from the donor surface by discharging ions of the metallic material away from the donor plate and onto the deposition substrate to form the metal line. Either the plurality of beams or the donor plate and deposition plate are actuated so the metallic material is ablated from the donor plate in a direction parallel to the metal line to be deposited.

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First Claim