Processing of pixel-based images for use in patterned substrates
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United States of America Patent
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-
Jan 30, 2001
Grant Date -
N/A
app pub date -
Dec 29, 1997
filing date -
Dec 29, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
This invention relates to an image processing method whereby large scale patterning artifacts in a pattern comprised of a large number of pattern repeats can be detected by processing a single pattern repeat and, if desired, the method can be used to modify the pattern repeat to render such artifacts less visually obtrusive.
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