Process solution supply system, substrate processing apparatus employing the system, and intermediate storage mechanism employed in the system
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United States of America Patent
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-
Feb 6, 2001
Grant Date -
N/A
app pub date -
May 14, 1999
filing date -
Jun 15, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A process solution supply system, comprising a process solution supply source from which a process solution is supplied, an intermediate storage mechanism for temporarily storing the process solution supplied from the process solution supply source and for supplying the process solution with predetermined pressure applied thereto, and a fluid supply mechanism for supplying the intermediate storage mechanism with a fluid which applies pressure to the process solution stored in the intermediate storage mechanism, the intermediate storage mechanism including a vessel which has an introduction port and a discharge port for the process solution, stores the process solution supplied through the introduction port and can discharge the process solution, and a compressing member, arranged inside the vessel to be located between the process solution and the fluid supplied from the fluid supply mechanism, for permitting pressure of the fluid to act on the process solution.
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