UV/halogen metals removal process
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United States of America Patent
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-
Feb 6, 2001
Grant Date -
N/A
app pub date -
Jun 1, 1999
filing date -
Mar 17, 1997
priority date (Note) -
In Force
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Abstract
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.
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