Method for removing microorganism contamination from a polishing slurry
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United States of America Patent
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Feb 6, 2001
Grant Date -
N/A
app pub date -
Oct 8, 1999
filing date -
Oct 8, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for removing microorganism contamination from a polishing slurry used for chemical mechanical polishing operations in the semiconductor manufacturing industry includes treating a slurry stream with ultraviolet (uv) energy to destroy the microorganisms, then filtering the uv-treated stream to remove the destroyed microorganisms before the slurry is delivered to the polishing apparatus.
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