Chamber apparatus for processing semiconductor devices
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United States of America Patent
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-
Feb 13, 2001
Grant Date -
N/A
app pub date -
Feb 24, 1998
filing date -
Feb 26, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus suitable for producing semiconductors. The apparatus includes a processing chamber, a first preparatory chamber, and a second preparatory chamber. Workpieces are transferred to the processing chamber for processing in a vacuum. The first and second preparatory chambers are used for transferring the workpiece between the processing chamber and an exterior exposed to atmospheric pressure without exposing the processing chamber to the atmospheric pressure. The first and second preparatory chambers are aligned vertically, which reduces the floor space occupied by the apparatus.
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