Heat treating apparatus
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United States of America Patent
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Feb 20, 2001
Grant Date -
N/A
app pub date -
May 19, 1999
filing date -
May 19, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A heat treating apparatus comprises a hot plate having a top surface on which is placed a substrate that is to be subjected to a heat treatment, setting means for setting an original target temperature of the hot plate required for subjecting the substrate to a heat treatment, a heat energy supply source for supplying a heat energy to the hot plate, a sensor for detecting the temperature of the hot plate, and control means receiving a detection signal from the sensor to obtain a difference in the detected temperature of the hot plate between the state that the substrate is not placed on the hot plate and the state that the substrate is placed on the hot plate, the original target temperature being switched based on the difference, and a signal denoting the switched target temperature in place of the original target temperature being supplied from the control means to the heat energy supply source.
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