Precursor solution compositions for electronic devices using CCVD
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United States of America Patent
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Feb 27, 2001
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N/A
app pub date -
Apr 29, 1998
filing date -
Apr 29, 1998
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Abstract
Precursor solutions are provided to produce thin film resistive materials by combustion chemical vapor deposition (CCVD) or controlled atmosphere combustion chemical vapor deposition (CACCVD). The resistive material may be a mixture of a zero valence metal and a dielectric material, or the resistive materials may be a conductive oxide.
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