Method and apparatus for cleaning a vacuum line in a CVD system
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United States of America Patent
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Feb 27, 2001
Grant Date -
N/A
app pub date -
Sep 25, 1995
filing date -
Sep 25, 1995
priority date (Note) -
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Abstract
An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that the constituents react to form gaseous products that may be pumped through the vacuum line. The apparatus may include a collection chamber structured and arranged to collect particulate matter flowing through the apparatus and inhibiting egress of the particulate matter from the apparatus. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
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