Application of electron field emission from diamond grown by a multiple pulsed laser process
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United States of America Patent
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Mar 13, 2001
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N/A
app pub date -
Jul 20, 1999
filing date -
Jul 20, 1998
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Abstract
The preparation and use of diamond as an electron emission material is disclosed. Satisfactory measurements were conducted on diamond coatings deposited on WC-Co alloy by a multiple pulsed laser process. The electron emission was measured in a diode configuration with a diamond surface-anode spacing of 20 and 50 .mu.m in vacuum at P=10.sup.-7 Torr. Current densities of 6 mA/cm were calculated at an applied of voltage of 3000 V (for 20 .mu.m). Analysis proved that electron field emission provided by a diamond grown by a multiple pulsed laser process proved to satisfactorily meet the specified demands.
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