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Abstract

A system and method for repairing a defect on a manufactured object, which may be a semiconductor wafer, uses a computer and a repair tool. The method includes placing the manufactured device on a moveable stage; capturing and preparing a digital-pixel-based representation of the image; symbolically decomposing the digital-pixel-based representation of an image to create a primitive-based representation of the image; analyzing the primitive-based representation of the image to detect and locate an anomaly; isolating primitives associated with the anomaly; comparing the isolated primitives associated with the anomaly with primitives in a knowledgebase to locate a set of primitives in the knowledgebase that are most like the isolated primitives associated with the anomaly; assigning a defect-type label associated with the set of primitives in the knowledge base that was most similar to the isolated primitives associated with the anomaly; and using a repair tool to repair the defect based on defect-type label for the anomaly.

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First Claim