Vacuum treatment system for application of thin, hard layers
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United States of America Patent
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Mar 27, 2001
Grant Date -
N/A
app pub date -
Apr 30, 1999
filing date -
May 2, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Vacuum treatment system for application of thin layers onto substrates (36, 38, 40, 42) with a transfer chamber (5) and several treatment chambers (6, 8, 10, 12), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (27, 29, 31, 33) for inlet and outlet of substrate (36, 38, 40, 42), and with a handling device (24) for transport of the substrate (36, 38, 40, 42) between the treatment chambers (6, 8, 10, 12), whereby the handling device (24) has at least one substrate holder (37, 39, 41, 43) with one pivot and/or rotating retaining part to hold the substrates (36, 38, 40, 42), by means of which the substrates (36, 38, 40, 42) can pivot and/or rotate in the treatment chambers (6, 8, 10, 12).
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