Coating film forming method and coating apparatus
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United States of America Patent
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-
Mar 27, 2001
Grant Date -
N/A
app pub date -
Apr 27, 1998
filing date -
May 7, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In forming a resist film by supplying a resist liquid onto a surface of an LCD substrate loaded in a rotation cup, a coating liquid is coated on the surface of the substrate by spraying the resist liquid onto the surface thereof while not rotating the substrate to thus form the coating film on the overall surface of the substrate, then the substrate is sealed into the rotation cup by closing the processing vessel by a lid member, and then a film thickness of the coating film is regulated by rotating the rotation cup and the substrate.
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