Plasma enhanced chemical deposition for high and/or low index of refraction polymers
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United States of America Patent
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Mar 27, 2001
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N/A
app pub date -
Dec 16, 1998
filing date -
Dec 16, 1998
priority date (Note) -
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Abstract
The method of the present invention for making a polymer layer with a selected index of refraction has the steps of (a) flash evaporating a monomer material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate; (b) passing the evaporate to a glow discharge electrode creating a glow discharge monomer plasma from the evaporate; and (c) cryocondensing the glow discharge monomer plasma on a substrate and crosslinking the glow discharge monomer plasma thereon, wherein the crosslinking results from radicals created in the glow discharge monomer plasma and achieves self curing and forms a polymer having the selected index of refraction.
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