Method of fabricating a solder resist mask
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 3, 2001
Grant Date -
N/A
app pub date -
May 28, 1999
filing date -
May 28, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for fabricating a solder mask. A substrate having wires is provided, and bonding pads are positioned on the wires for coupling with other devices. A first solder resist layer is formed over the substrate to cover the wires and the substrate. A precure process is performed. A portion of the first solder resist layer is removed to expose the wires, and then the residual first solder resist layer is cured. A second solder resist layer is formed to cover the residual first solder resist layer and the wires. After precuring, a portion of the second solder resist layer is removed to expose the bonding pads.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully