Method and apparatus for modulating an incident light beam for forming a two-dimensional image
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United States of America Patent
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Apr 10, 2001
Grant Date -
N/A
app pub date -
Jun 24, 1998
filing date -
Jun 24, 1998
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Abstract
An apparatus and method for modulating an incident light beam for forming a two-dimensional projection image. The apparatus includes a plurality of elongated elements each having a reflective surface. The elongated elements are suspended substantially parallel to each other above a substrate with their respective ends supported, forming a column of adjacent reflecting surfaces grouped according to display elements. Alternate ones of each group are deformable by a applying a voltage with respect to the substrate. An approximately flat center section of each deformed element is substantially parallel to and a predetermined distance from a center section of each undeformed element. Limiting the predetermined distance avoids hysteresis in deforming the elements and avoids adhesion of the elements to the substrate. A light beam incident to the column of adjacent reflecting surfaces is reflected from a group of elongated elements when the alternate ones are undeformed and diffracted when alternate ones are deformed. A distance of movement is controlled or a ratio of between reflection and diffraction periods determines a display intensity for the corresponding display element. Diffracted light is collected by a lens and reflected by a scanning mirror into an eyepiece or onto a display screen. A light shield having a slit of predetermined width is positioned at the pupil such that light collected by the lens other than light diffracted from the center sections of the elongated elements is prevented from passing through the slit. The scanning mirror sweeps a two-dimensional color image into the eyepiece or onto the display screen.
First Claim
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- SILICON LIGHT MACHINES CORPORATION
International Classification(s)
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- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Bloom, David M | Palo Alto, CA | 80 | 4539 |
Godil, Asif | Mountain View, CA | 5 | 128 |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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