Method and device for detecting an incorrect position of a semiconductor wafer
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United States of America Patent
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Apr 17, 2001
Grant Date -
N/A
app pub date -
Oct 28, 1998
filing date -
Oct 30, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and device for detecting an incorrect position of a semiconductor wafer during a high-temperature treatment of the semiconductor water in a quartz chamber which is heated by IR radiators, has the semiconductor wafer lying on a rotating support and being held at a specific temperature with the aid of a control system. Thermal radiation which is emitted by the semiconductor wafer and the IR radiators is recorded using a pyrometer. The radiation temperature of the recorded thermal radiation is determined. The semiconductor wafer is assumed to be in an incorrect position if the temperature of the recorded thermal radiation fluctuates to such an extent over the course of time that the fluctuation width lies outside a fluctuation range .DELTA.T which is regarded as permissible.
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