Light energy cleaning of polishing pads
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United States of America Patent
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-
Apr 17, 2001
Grant Date -
N/A
app pub date -
Jan 20, 1999
filing date -
Jan 20, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for cleaning polishing debris from the surface of a polishing pad by wetting the surface with a liquid and irradiating the wetted surface with a beam of light. The light beam has sufficient intensity at the polishing surface of the pad to vaporize at least a portion of the liquid such that the vaporized liquid causes at least a portion of the debris to be expelled from the polishing surface of the pad.
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