Resist processing system having process solution deaeration mechanism
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United States of America Patent
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Apr 17, 2001
Grant Date -
N/A
app pub date -
Oct 21, 1998
filing date -
Sep 13, 1996
priority date (Note) -
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Abstract
A resist processing system includes a sensor connected for detecting the surface level of the processing solution contained in an intermediate tank, and a controller connected for controlling the fluid pressure on the basis of the surface level detected by the sensor.
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