Multi-layer reactive sputtering method with reduced stabilization time
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United States of America Patent
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Apr 17, 2001
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N/A
app pub date -
Jun 3, 1997
filing date -
Jun 3, 1997
priority date (Note) -
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Abstract
A method is described for depositing a complex optical multilayer coating on a substrate. The coating consists of multiple layers of at least two material types. The layers are sequentially deposited in a deposition chamber by reactive deposition; preferably sputtering, and the thickness of the deposited layers is determined one or more times during the layer deposition by taking optical measurements of the deposited layer and fitting theoretical values derived from a model of the deposited layers to the corresponding actual values obtained from said measurements. A process variable is continually controlled to ensure homogeneity of the deposited layers so that a valid thickness determination can be made from said theoretical model.
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