Two-step borophosphosilicate glass deposition process and related devices and apparatus
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United States of America Patent
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Apr 17, 2001
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N/A
app pub date -
May 5, 1998
filing date -
May 5, 1998
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Expired
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Abstract
A method for forming a BPSG film from a two-step deposition process and related apparatus and devices. A conformal layer of BPSG is deposited on a substrate. A more stable layer of BPSG is deposited at a higher deposition rate over the conformal layer. The method is suitable for filling trenches at least as narrow as 0.06 microns with aspect ratios of at least 5.5:1.
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