Methods to fabricate thin film transistors and circuits
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 1, 2001
Grant Date -
N/A
app pub date -
May 3, 1999
filing date -
May 3, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for fabricating a thin film field effect transistor is described in this invention. The active layer of the thin film transistor (TFT) is formed by a low cost chemical bath deposition method. The fabrication procedure includes deposition of a metal layer on an insulating substrate, patterning of the metal layer to form a metal gate, formation of the di-electric layer, deposition of the active layer and formation of source and drain contacts.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully