| 7,234,477 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
|
13 |
2002
|
| 7,240,679 System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
|
5 |
2002
|
| 7,198,055 Meniscus, vacuum, IPA vapor, drying manifold
|
7 |
2002
|
| 7,252,097 System and method for integrating in-situ metrology within a wafer process
|
5 |
2003
|
| 7,153,400 Apparatus and method for depositing and planarizing thin films of semiconductor wafers
|
15 |
2003
|
| 7,264,007 Method and apparatus for cleaning a substrate using megasonic power
|
1 |
2003
|
| 8,062,471 Proximity head heating method and apparatus
|
1 |
2004
|
| 7,045,018 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same
|
3 |
2004
|
| 7,614,411 Controls of ambient environment during wafer drying using proximity head
|
0 |
2004
|
| 7,513,262 Substrate meniscus interface and methods for operation
|
1 |
2004
|
| 7,389,783 Proximity meniscus manifold
|
5 |
2004
|
| 7,293,571 Substrate proximity processing housing and insert for generating a fluid meniscus
|
2 |
2004
|
| 8,236,382 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same
|
0 |
2004
|
| 7,383,843 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
|
4 |
2004
|
| 6,954,993 Concentric proximity processing head
|
26 |
2004
|
| 7,003,899 System and method for modulating flow through multiple ports in a proximity head
|
2 |
2004
|
| 7,675,000 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology
|
0 |
2004
|
| 7,632,376 Method and apparatus for atomic layer deposition (ALD) in a proximity system
|
3 |
2005
|
| 7,520,284 Apparatus for developing photoresist and method for operating the same
|
2 |
2005
|
| 7,810,513 Substrate preparation using megasonic coupling fluid meniscus and methods, apparatus, and systems for implementing the same
|
2 |
2005
|
| 7,143,527 System and method for modulating flow through multiple ports in a proximity head
|
6 |
2005
|
| 7,584,761 Wafer edge surface treatment with liquid meniscus
|
2 |
2005
|
| 7,127,831 Methods and systems for processing a substrate using a dynamic liquid meniscus
|
4 |
2005
|
| 7,383,601 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same
|
1 |
2006
|
| 7,464,719 Multi-menisci processing apparatus
|
1 |
2006
|
| 7,597,765 Post etch wafer surface cleaning with liquid meniscus
|
1 |
2006
|
| 7,946,303 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus
|
2 |
2006
|
| 7,383,844 Meniscus, vacuum, IPA vapor, drying manifold
|
1 |
2006
|
| 7,928,366 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access
|
0 |
2006
|
| 7,703,462 Reduction of entrance and exit marks left by a substrate-processing meniscus
|
2 |
2006
|
| 7,350,316 Meniscus proximity system for cleaning semiconductor substrate surfaces
|
3 |
2007
|
| 7,975,708 Proximity head with angled vacuum conduit system, apparatus and method
|
0 |
2007
|
| 8,146,902 Hybrid composite wafer carrier for wet clean equipment
|
0 |
2007
|
| 7,387,689 Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
|
3 |
2007
|
| 7,722,724 Methods for substrate processing in cluster tool configurations having meniscus application systems
|
0 |
2007
|
| 8,141,566 System, method and apparatus for maintaining separation of liquids in a controlled meniscus
|
0 |
2007
|
| 7,997,288 Single phase proximity head having a controlled meniscus for treating a substrate
|
0 |
2007
|
| 7,406,972 Substrate proximity processing structures
|
1 |
2007
|
| 7,568,488 Enhanced wafer cleaning method
|
1 |
2007
|
| 7,534,307 Methods for processing wafer surfaces using thin, high velocity fluid layer
|
0 |
2008
|
| 8,317,934 Multi-stage substrate cleaning method and apparatus
|
0 |
2009
|
| 8,313,580 Method for processing a substrate using a single phase proximity head having a controlled meniscus
|
0 |
2011
|
