Wafer cleaning apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 15, 2001
Grant Date -
N/A
app pub date -
Jul 9, 1998
filing date -
Jul 15, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During unloading of the wafer after cleaning, the wafer is located vertically between the first and second brushes and on a pair of rollers. A finger tip located vertically above the region between the first and second brushes contacts an edge of the wafer and thus hold the wafer in the precise unloading position at which a wafer transfer robotic arm has been programmed to engage/disengage the wafer. Accordingly, the wafer is reliably and repeatedly engaged by the robotic arm.
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Cited Art Landscape
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