Developing method and developing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Jun 5, 2001
Grant Date -
N/A
app pub date -
May 14, 1999
filing date -
May 26, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A developing method comprising, a step of holding a substrate in substantially a horizontal position, the substrate coated with a photoresist film which has a pattern-exposed region where a predetermined circuit pattern is formed by light exposure, and a step of developing the photoresist film by starting to apply, at a time, a developing solution to the entire pattern-exposed region of the photoresist film.
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