Lithographic plate having a conformal radiation-sensitive layer on a rough substrate
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United States of America Patent
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Jun 5, 2001
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N/A
app pub date -
Jun 28, 2000
filing date -
Jun 28, 2000
priority date (Note) -
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Abstract
This invention discloses a lithographic plate comprising on a roughened substrate a substantially conformal radiation-sensitive layer. The radiation-sensitive layer can be a photo hardenable or photo solubilizable layer, or can be a laser ablatable layer. The radiation-sensitive layer is substantially conformally coated on the roughened substrate surface in a way so that the surface of the radiation-sensitive layer has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.
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