Two-dimensional image detecting device and manufacturing method thereof
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United States of America Patent
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Jun 5, 2001
Grant Date -
N/A
app pub date -
Jan 29, 1999
filing date -
Feb 9, 1998
priority date (Note) -
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Abstract
In a two-dimensional image detecting device, an active-matrix substrate which is provided with an electrical charge storage capacity and TFT(thin-film transistor) and an opposing substrate which is provided with a semiconductive substrate are bonded to each other by using connecting members with conductivity and bonding property that are patterned in accordance with pixel electrodes of the electrical charge storage capacity. With this arrangement, it is not necessary to form a semiconductive layer onto the active-matrix substrate, the TFT having been already formed on the active-matrix substrate; thus, it is possible to form the semiconductive substrate of the opposing substrate that is made of a material selected from the group consisting of CdTe and CdZnTe, etc. Consequently, the two-dimensional image detecting device is superior in response and is capable of dealing with moving image as well.
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