Method and apparatus for drying substrate
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United States of America Patent
Stats
-
Jun 12, 2001
Grant Date -
N/A
app pub date -
Nov 12, 1998
filing date -
Nov 19, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for drying a substrate after the substrate is rinsed in a rinsing bath in which a rinsing liquid is contained. The substrate is vertically held selectively by first and second holders. The second holder is located between and below the first holders. Each of the first and second holders includes grooves with which the substrate is engageable. When the level of the rinsing liquid downwardly passes past the grooves of the first holders, the substrate is held solely by the second holder. Then, when the level of the rinsing liquid downwardly passes past the grooves of the second holder, the substrate is held solely by the first holder.
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