Apparatus for igniting a plasma in a plasma processing chamber
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Jun 12, 2001
Issued Date -
N/A
app pub date -
Dec 21, 1999
filing date -
Apr 10, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus to prevent charging of a substrate, retained by an electrostatic chuck in a plasma chamber, during ignition of a plasma. The method deactivates a voltage to the chuck electrodes (or other conductive element in a substrate support pedestal) and allows the chuck electrodes to float during ignition of the plasma. The method activates the chuck electrodes again following the ignition of the plasma.
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