Process for producing sputtering targets
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United States of America Patent
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-
Jun 19, 2001
Grant Date -
N/A
app pub date -
Dec 12, 1997
filing date -
May 18, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process for producing sputtering targets, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900.degree. C. or above with a powder of a low-melting metal having a melting point of 700.degree. C. or below at a temperature below the melting point of the low-melting metal under heat and pressure.
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