Method for controlling a process for patterning a feature in a photoresist
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United States of America Patent
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Jun 19, 2001
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N/A
app pub date -
Jul 19, 1999
filing date -
Jul 19, 1999
priority date (Note) -
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Abstract
A method and controller for controlling a process and system for patterning a feature in a photoresist on a semiconductor wafer. The present invention characterizes various components (both individually and collectively) of an image transfer system, including the illumination source, lens and product reticle, with regard to dimensional errors introduced into the image transfer process by these components. The collective error data or information provided in accordance with the present invention may be communicated to the image transfer system to control the image transfer system and the image transfer process and to ensure that the actual dimension of features patterned in the photoresist are within acceptable dimensional limits for these features.
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